US Patent Issued to ESOL on March 11 for "EUV light source device and plasma gas recycling system for high-density plasma generation" (South Korean Inventor)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,250,763, issued on March 11, was assigned to ESOL Inc. (Hwaseong-si, South Korea).

"EUV light source device and plasma gas recycling system for high-density plasma generation" was invented by Dong Gun Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet (EUV) light source device for generating EUV light through a plasma reaction, includes: a focusing lens for focusing a laser beam generated from a laser source; a vacuum chamber for providing a vacuum environment to generate the laser beam focused on the focusing lens as the EUV light through the plasma reaction; a gas jet nozzle for supplying a plasma reac...