US Patent Issued to ESOL on June 17 for "High-performance EUV microscope with free form illumination system" (South Korean Inventor)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,188, issued on June 17, was assigned to ESOL Inc. (Hwaseong-si, South Korea).

"High-performance EUV microscope with free form illumination system" was invented by Dong Gun Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A high-performance EUV microscope with a free form illumination system, includes: an EUV light source that outputs EUV light; one spherical mirror, which receives and reflects the EUV light outputted from the EUV light source and includes a two-axis drive part for controlling reflection direction of incident light through two-axis angle scan; one plane mirror, which receives the reflected light reflected ...