US Patent Issued to ESOL on April 29 for "High-performance EUV microscope device with free-form illumination system structure having elliptical mirror" (South Korean Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,579, issued on April 29, was assigned to ESOL Inc. (Hwaseong-si, South Korea).

"High-performance EUV microscope device with free-form illumination system structure having elliptical mirror" was invented by Dong Gun Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A high performance EUV microscope device with a freeform illumination system having an elliptical mirror, includes: an EUV source for outputting EUV light; a spherical mirror having a two-axis driving unit which receives and reflects the EUV light output from the EUV light source and controls a reflection direction of the incident light through two-axis angle scan...