ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,218,279, issued on Feb. 4, was assigned to EPISTAR Corp. (Hsinchu, Taiwan).
"Optoelectronic device and method for manufacturing the same" was invented by Chao-Hsing Chen (Hsinchu, Taiwan), Jia-Kuen Wang (Hsinchu, Taiwan), Chien-Chih Liao (Hsinchu, Taiwan), Tzu-Yao Tseng (Hsinchu, Taiwan), Tsun-Kai Ko (Hsinchu, Taiwan) and Chien-Fu Shen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optoelectronic device includes a first semiconductor layer, a second semiconductor layer and an active layer between the first semiconductor layer and the second semiconductor layer; a first insulating layer on the second semiconductor layer and including a...