US Patent Issued to EPG (ENGINEERED NANOPRODUCTS GERMANY) on April 29 for "Method for producing doped alkali silicate protective layers on metal and glass substrates" (French, German Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,286,560, issued on April 29, was assigned to EPG (ENGINEERED NANOPRODUCTS GERMANY) AG (Griesheim, Germany).

"Method for producing doped alkali silicate protective layers on metal and glass substrates" was invented by Klaus Endres (Bad Homburg, Germany), Barbara Kutzky (Saarbruecken, Germany), Emilie Pierre (Willerwald, France) and Thomas Dembski (Guenviller, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a glass-like protective layer on an optionally pre-coated metal or glass substrate. The method comprises: (a) mixing one or more defined silicon compounds with NaOH and KOH, (b) adding water to the mixture obtained in (a) to...