US Patent Issued to Entire Technology on June 3 for "Diffusion plate for use in backlight module with low optical path distance" (Taiwanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,061, issued on June 3, was assigned to Entire Technology Co. Ltd. (Taoyuan, Taiwan).

"Diffusion plate for use in backlight module with low optical path distance" was invented by Chih Wen Yang (Taoyuan, Taiwan) and Yu Wei Chang (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention discloses a diffusion plate for use in a backlight module with a low optical path distance (OD), which can be assembled on a backlight module with a plurality of light-emitting diodes (LEDs) as the light source below. Different diffusion particle additives are added to the surface layers and the main layer of the diffusion plate, and then extrude it w...