US Patent Issued to ENTEGRIS on Nov. 25 for "Chlorine-containing precursors for ion implantation systems and related methods" (Connecticut Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,628, issued on Nov. 25, was assigned to ENTEGRIS INC. (Billerica, Mass.).

"Chlorine-containing precursors for ion implantation systems and related methods" was invented by Joseph R. Despres (Middletown, Conn.) and Ying Tang (Brookfield, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method for generating aluminum ions for implantation into a substrate. The system and method comprise flowing a chlorine-containing gas from a first vessel, optionally with a hydrogen-containing co-gas and optionally with a fluorine-containing co-gas, to an ion source chamber of an ion implantation device. The ion source chamber comprises a solid alumi...