US Patent Issued to ENTEGRIS on May 27 for "Methods for depositing a tungsten or molybdenum layer in the presence of a reducing co-reactant" (Connecticut, New York Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,678, issued on May 27, was assigned to ENTEGRIS INC. (Billerica, Mass.).

"Methods for depositing a tungsten or molybdenum layer in the presence of a reducing co-reactant" was invented by Robert Wright Jr. (Newtown, Conn.), Bryan C. Hendrix (Danbury, Conn.), Thomas H. Baum (New Fairfield, Conn.) and James Woeckener (Wappingers Falls, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described are vapor deposition methods for depositing metal films or layers onto a substrate, e.g., wherein the metal is molybdenum or tungsten; the methods involve vapor deposition of a metal layer onto a substrate from a metal-containing precursor in the presence of r...