US Patent Issued to ENTEGRIS on Feb. 17 for "Pellicle comprising silicon carbide nanostructure and related devices and methods" (Texas, Massachusetts Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,193, issued on Feb. 17, was assigned to ENTEGRIS INC. (Billerica, Mass.).

"Pellicle comprising silicon carbide nanostructure and related devices and methods" was invented by Amelia Heather-Sarah Church Hart (Fort Worth, Texas) and James O'Neill (Winchester, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are pellicles for use in extreme ultraviolet (EUV) lithography, the pellicles comprising silicon carbide nanostructures, and exhibiting high transmittance of EUV exposure light and high mechanical strength, as well as methods of using these pellicles."

The patent was filed on Nov. 29, 2022, under Application No. 18/071,296.

*For fur...