ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,473, issued on Dec. 2, was assigned to ENTEGRIS INC. (Billerica, Mass.).
"Post CMP cleaning composition" was invented by Volley Wang (Zhubei, Taiwan), Atanu K. Das (Southbury, Conn.), Michael L. White (Ridgefield, Conn.), Chun-I Lee (Zhubei, Taiwan), Nilesh Gunda (North Chelmsford, Mass.), Daniela White (Ridgefield, Conn.) and Donald Frye (Sherman, Conn.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C6-C12 alkyl)alcohol; and water; wherein the c...