US Patent Issued to ENF TECHNOLOGY on Aug. 12 for "Etchant composition for titanium-containing metal layer and etching method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,385,142, issued on Aug. 12, was assigned to ENF TECHNOLOGY Co. LTD. (Yongin-si, South Korea).

"Etchant composition for titanium-containing metal layer and etching method using the same" was invented by Sang Seung Park (Yongin-si, South Korea), Yang Ryoung Kim (Yongin-si, South Korea), Bo Yeon Lee (Yongin-si, South Korea), Min Gyeong Jeong (Yongin-si, South Korea) and Se Hoon Kim (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are an etchant composition for a titanium-containing metal layer, and a method using the same, which may selectively etch the titanium-containing metal layer without affecting the quality of other fi...