ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,013, issued on June 17, was assigned to ENEOS Corp. (Tokyo).
"Production method for indan and hydrindane" was invented by Yasuhiro Araki (Tokyo), Atsushi Segawa (Tokyo), Yasuyuki Iwasa (Tokyo), Tai Ohuchi (Tokyo), Kazuya Mayumi (Tokyo) and Yukihiro Yoshiwara (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a production method for indan and hydrindane, including a reaction step of introducing a raw material composition including tetrahydroindene into a continuous reactor including a solid catalyst containing platinum, and bringing the raw material composition into contact with the solid catalyst under the conditions of 150deg C. to 3...