US Patent Issued to ENEOS on Aug. 5 for "Pressure swing adsorption (PSA) device and pressure swing adsorption method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,377,382, issued on Aug. 5, was assigned to ENEOS Corp. (Tokyo).

"Pressure swing adsorption (PSA) device and pressure swing adsorption method" was invented by Nanako Obata (Tokyo), Tadashi Seike (Tokyo), Seiji Maeda (Tokyo), Daisaku Tateishi (Tokyo) and Ai Minoda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one aspect of the present invention, a pressure swing adsorption (PSA) device includes an adsorption tower configured to introduce hydrogen gas and adsorb impurity components in the hydrogen gas by using a pressure swing adsorption (PSA) method, an adsorbent of one layer made of activated carbon or an adsorbent of two layers in wh...