ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,078, issued on Nov. 18, was assigned to EN2CORE TECHNOLOGY INC. (Daejeon, South Korea).
"Plasma generation device and control method therefor" was invented by Sae Hoon Uhm (Hwaseong, South Korea), Yun Seong Lee (Daejeon, South Korea), Yeong Hoon Sohn (Daejeon, South Korea) and Se Hong Park (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power sourc...