US Patent Issued to EN2CORE TECHNOLOGY on Aug. 19 for "Inductive coil structure and inductively coupled plasma generation system" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,394,594, issued on Aug. 19, was assigned to EN2CORE TECHNOLOGY INC. (Daejeon, South Korea).

"Inductive coil structure and inductively coupled plasma generation system" was invented by Sae Hoon Uhm (Gyeonggi-do, South Korea) and Yun Seong Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative o...