US Patent Issued to EMD, TOMOEGAWA on July 8 for "Radio-frequency antenna and plasma processing device" (Japanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,839, issued on July 8, was assigned to EMD Corp. (Yasu, Japan) and TOMOEGAWA Corp. (Tokyo).

"Radio-frequency antenna and plasma processing device" was invented by Akinori Ebe (Kyoto, Japan), Hajime Tsuda (Shizuoka, Japan) and Hideki Moriuchi (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radio-frequency antenna through which a high amount of current can be efficiently passed even at a radio-frequency level for plasma generation, as well as a plasma processing device utilizing the radio-frequency antenna. A radio-frequency antenna includes a metal fiber sheet. A plasma processing device includes: a vacuum container including a wall ...