US Patent Issued to Elekta (Shanghai) Technology on Sept. 23 for "Automatic beam modeling based on deep learning" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,420,112, issued on Sept. 23, was assigned to Elekta (Shanghai) Technology Co. Ltd. (Shanghai).

"Automatic beam modeling based on deep learning" was invented by Shufei Chen (Shanghai) and Lu Yuan (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for generating a beam model for radiotherapy treatment planning are discussed. An exemplary system includes a memory to store a trained deep learning model, and a processor circuit to generate a beam model. The deep learning model can be trained to establish a relationship between machine scanning data and values of beam model parameters, and validated for accuracy. The processor circu...