US Patent Issued to Elekta (Shanghai) Technology on Aug. 5 for "Evaluation and presentation of robustness of a treatment plan" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,377,288, issued on Aug. 5, was assigned to Elekta (Shanghai) Technology Co. Ltd. (Shanghai).

"Evaluation and presentation of robustness of a treatment plan" was invented by Weisheng Duan (Shanghai) and Yue Yuan (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for evaluating and presenting robustness of a radiotherapy treatment plan for use in radiotherapy are discussed. An exemplary system includes a processor to generate, in a radiation simulation in accordance with the treatment plan under evaluation, dose distributions at an anatomical structure under a nominal condition and one or more artificially imposed uncertainty cond...