ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,605, issued on Sept. 23, was assigned to EGTM Co. Ltd. (Suwon-si, South Korea).
"Method for areal selective forming of thin film" was invented by Ju Hwan Jeong (Suwon-si, South Korea), Hyeon Sik Cho (Suwon-si, South Korea), Han Bin Lee (Suwon-si, South Korea), Sun Young Baik (Suwon-si, South Korea), Woong Jin Choi (Suwon-si, South Korea), Ha Na Kim (Suwon-si, South Korea), Myeong Il Kim (Suwon-si, South Korea) and Kyu Ho Cho (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for areal selective forming of a thin film according to an exemplary embodiment of the present disclosure including: a substrate prepara...