US Patent Issued to Edwards Japan on Jan. 13 for "Abatement device, deposited material removing means, and deposited material removing method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,521,770, issued on Jan. 13, was assigned to Edwards Japan Ltd. (Chiba, Japan).

"Abatement device, deposited material removing means, and deposited material removing method" was invented by Katsunori Takahashi (Chiba, Japan), Masahiro Tanaka (Chiba, Japan) and Jinquan Guan (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to efficiently remove deposited material adhering to the interior of an abatement device, an abatement device is equipped with a deposited material removing means for removing deposited material produced during abatement of exhaust gas. The deposited material removing means includes: a storage unit that stores a liqu...