US Patent Issued to ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) on Dec. 2 for "Method and apparatus for volumetric additive manufacturing with digital distortion compensation" (Swiss Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,485,618, issued on Dec. 2, was assigned to ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) (Lausanne, Switzerland).

"Method and apparatus for volumetric additive manufacturing with digital distortion compensation" was invented by Damien Loterie (Ecublens, Switzerland), Paul Delrot (Morges, Switzerland) and Christophe Moser (Lausanne, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is related to a method of digitally compensating distortions of rays of a light beam in tomography-based additive manufacturing, wherein said tomography-based additive manufacturing involves projecting light patterns from multiple angles into a ...