US Patent Issued to ECO3 on Feb. 18 for "Lithographic photopolymer printing plate precursor with improved daylight stability" (Belgian Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,226,997, issued on Feb. 18, was assigned to ECO3 BV (Mortsel, Belgium).

"Lithographic photopolymer printing plate precursor with improved daylight stability" was invented by Katleen Himschoot (Mortsel, Belgium), Eva Vermeiren (Mortsel, Belgium), Thomas Billiet (Mortsel, Belgium) and Fabienne Goethals (Mortsel, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic printing plate precursor is disclosed which comprises a support, a photopolymerizable image recording layer and an overcoat which comprises a low-molecular radical inhibitor. After image-wise exposure, the plate is heated whereby the radical inhibitor diffuses from the overcoat ...