US Patent Issued to eChem Solutions on July 29 for "Photosensitive resin composition, optical film, and method of producing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,870, issued on July 29, was assigned to eChem Solutions Corp. (Taoyuan, Taiwan).

"Photosensitive resin composition, optical film, and method of producing the same" was invented by Jui-Yu Hsu (Taoyuan, Taiwan), Chia-Hao Lou (Taoyuan, Taiwan) and Chen-Wen Chiu (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive resin composition, an optical film and a method of producing the same are provided. The photosensitive resin composition includes a thiol compound (A) having two or more groups represented by formula (I-a), a polyether-modified polysiloxane (B), an ethylenically unsaturated group-containing compound (C) having one o...