US Patent Issued to EBARA on Oct. 21 for "Chemical supply apparatus, cleaning system, and chemical supply method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,449, issued on Oct. 21, was assigned to EBARA Corp. (Tokyo).

"Chemical supply apparatus, cleaning system, and chemical supply method" was invented by Fujihiko Toyomasu (Tokyo), Junji Kunisawa (Tokyo) and Kenichiro Saito (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a chemical supply apparatus, a cleaning system, and a chemical supply method that can supply a cleaning chemical to two nozzles and also supply the cleaning chemical at a set flow rate to one of the nozzles.A chemical supply apparatus according to the present disclosure includes: a first cleaning chemical supply pipe; a first mixer that mixes a firs...