US Patent Issued to EBARA on Nov. 4 for "Substrate processing apparatus, computer-readable storage medium storing a program, and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,062, issued on Nov. 4, was assigned to EBARA Corp. (Tokyo).

"Substrate processing apparatus, computer-readable storage medium storing a program, and substrate processing method" was invented by Masayoshi Imai (Tokyo) and Mitsuru Miyazaki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a substrate processing apparatus for processing a substrate. The substrate processing apparatus (1) includes a controller (90). The controller (90) rotates the substrate (W) at a second speed, after rotating the substrate (W) at a first speed. The controller (90) supplies a dry fluid from a dry fluid nozzle (30) onto the substrate ...