ALEXANDRIA, Va., Nov. 18 -- United States Patent no. D1,102,398, issued on Nov. 18, was assigned to EBARA Corp. (Tokyo).
"Seal for chemical mechanical polishing device" was invented by Kazuhiro Tajima (Tokyo), Makoto Kashiwagi (Tokyo) and Manato Furusawa (Tokyo).
The patent was filed on Sept. 26, 2023, under Application No. D/522,433.
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