US Patent Issued to EBARA on July 29 for "Substrate cleaning apparatus and substrate cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,370,578, issued on July 29, was assigned to EBARA Corp. (Tokyo).

"Substrate cleaning apparatus and substrate cleaning method" was invented by Fumitoshi Oikawa (Tokyo), Koichi Fukaya (Tokyo) and Mitsuru Miyazaki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning apparatus includes a substrate rotation supporting section that supports and rotates a substrate; a roll holding section that rotatably holds a first roll cleaning member and a second roll cleaning member each having a length almost equal to a radius of the substrate; a roll rotation drive section that rotates the first roll cleaning member and the second roll cleaning mem...