US Patent Issued to EBARA on July 15 for "Rubber membrane having first and second hardness for use in a polishing head" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,358,096, issued on July 15, was assigned to EBARA Corp. (Tokyo).

"Rubber membrane having first and second hardness for use in a polishing head" was invented by Osamu Nabeya (Tokyo) and Shingo Togashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An elastic membrane having a physical property required for each portion of the elastic membrane and capable of uniformly polishing a workpiece is disclosed. The elastic membrane includes: a contact portion having a workpiece pressing surface for pressing a workpiece against a polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber. The contact por...