US Patent Issued to EBARA on July 15 for "Cleaning apparatus for cleaning member, cleaning method for cleaning member, and substrate cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,358,028, issued on July 15, was assigned to EBARA Corp. (Tokyo).

"Cleaning apparatus for cleaning member, cleaning method for cleaning member, and substrate cleaning method" was invented by Megumi Uno (Tokyo), Akira Fukunaga (Tokyo), Chikako Takatoh (Tokyo) and Yumiko Nakamura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning apparatus for cleaning member has a member cleaning part 30 that cleans a cleaning member 10 that cleans a substrate W; and a measurement part 20 that measures a degree of cleanliness of the cleaning member 10 cleaned by the member cleaning part 30."

The patent was filed on Dec. 14, 2021, under Application No. 18/26...