US Patent Issued to EBARA on Jan. 20 for "Substrate cleaning device and substrate processing device" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,694, issued on Jan. 20, was assigned to EBARA Corp. (Tokyo).

"Substrate cleaning device and substrate processing device" was invented by Yohei Eto (Tokyo), Mitsuru Miyazaki (Tokyo) and Hisajiro Nakano (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure provides a substrate cleaning device and a substrate processing device capable of suppressing erroneous rotation detection of an optical sensor due to adhesion of droplets or mist. A substrate cleaning device includes a substrate cleaning part for cleaning a substrate, a drive roller for rotating the substrate, a driven roller rotated by the substrate, and a rotation detection part fo...