US Patent Issued to E Ink on Oct. 28 for "Electrophoretic particle film having reduced diffraction in an open state" (Irish, American Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,486, issued on Oct. 28, was assigned to E Ink Corp. (Billerica, Mass.).

"Electrophoretic particle film having reduced diffraction in an open state" was invented by Donal Martin O'Keeffe (Clare, Ireland) and Brian D. Bean (Newton, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A switchable light modulating device with an electrophoretic medium disposed between a first light-transmissive electrode layer and a second electrode layer. The device includes one or more apodization structures in a bottom of a cell that contains the electrophoretic fluid, and the apodization structures reduce optical interference when the cell is in an open state and t...