US Patent Issued to E Ink Holdings on Sept. 30 for "Anti-glare layer and manufacturing method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,765, issued on Sept. 30, was assigned to E Ink Holdings Inc. (Hsinchu, Taiwan).

"Anti-glare layer and manufacturing method thereof" was invented by Chien-Hsing Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An anti-glare layer and a manufacturing method thereof are provided. The manufacturing method of the anti-glare layer includes providing a substrate, coating an anti-glare material layer on the substrate, and performing a photolithography process on the anti-glare material layer through a gray-scale mask to form the anti-glare layer. The anti-glare layer includes multiple protrusion portions with different heights."

The p...