ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,228,858, issued on Feb. 18, was assigned to DUPONT SPECIALTY MATERIALS KOREA LTD (Chungcheongnam-Do, South Korea).
"Coating composition for forming resist underlayer film for EUV lithography process" was invented by Jae Hwan Sim (Cheonan-si, South Korea), Suwoong Kim (Cheonan-si, South Korea), Jin Hong Park (Cheonan-si, South Korea), Myung Yeol Kim (Cheonan-si, South Korea), Yoo-Jin Ghang (Cheonan-si, South Korea) and Jae-Bong Lim (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A monomer represented by Chemical Formula (1):wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units ...