ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,971, issued on May 27, was assigned to DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC (Marlborough, Mass.).
"Coated underlayer for overcoated photoresist" was invented by Anton Chavez (West Newton, Mass.), Iou-Sheng Ke (Andover, Mass.) and Shintaro Yamada (Shrewsbury, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a pattern, the method comprising applying a layer of a coating composition over a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer over the coated underlayer, wherein the coating composition comprises a first material comprising two or more hydroxy group...