US Patent Issued to DUPONT ELECTRONIC MATERIALS INTERNATIONAL on July 29 for "Photoresists comprising multiple acid generator compounds" (Massachusetts Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,867, issued on July 29, was assigned to DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC (Marlborough, Mass.).

"Photoresists comprising multiple acid generator compounds" was invented by James W. Thackeray (Braintree, Mass.), Jin Wuk Sung (Worcester, Mass.), Paul J. LaBeaume (Auburn, Mass.) and Vipul Jain (North Grafton, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to new photoresist compositions that comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups."

The patent was filed on Sep...