US Patent Issued to DUK SAN NEOLUX on Nov. 4 for "Low reflectivity photosensitive resin composition and light-shielding layer using same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,445, issued on Nov. 4, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea).

"Low reflectivity photosensitive resin composition and light-shielding layer using same" was invented by Changmin Lee (Cheonan-si, South Korea), Yun Jong Ko (Cheonan-si, South Korea), Jun Bae (Cheonan-si, South Korea), Jun Ki Kim (Cheonan-si, South Korea), Hyunsang Cho (Cheonan-si, South Korea) and Soung Yun Mun (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment of the present disclosure, a photosensitive resin composition comprising a resin containing a repeating unit represented by Chemical Formula (1), a dye re...