ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,142, issued on Nov. 11, was assigned to Draka Comteq B.V. (Delft, Netherlands).

"Method and an apparatus for performing a plasma chemical vapour deposition process and a method" was invented by Mattheus Jacobus Nicolaas van Stralen (Delft, Netherlands), Igor Milicevic (Delft, Netherlands), Gertjan Krabshuis (Delft, Netherlands) and Ton Breuls (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method and an apparatus for performing a plasma chemical vapour deposition process. The apparatus comprises a mainly cylindrical resonator being provided with an outer cylindrical wall and an inner coaxial cylindrical ...