ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,001, issued on June 3, was assigned to DONGWOO FINE-CHEM Co. LTD. (Iksan-si, South Korea).
"Method of preparing a polarizing plate for antireflection" was invented by Dongduk Choi (Bucheon-si, South Korea), Jihoon Kong (Siheung-si, South Korea) and Ji Hoon Kim (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a polarizing plate for antireflection including a polarizer, and a protective layer formed on at least one surface of the polarizer, wherein the polarizing plate has a single transmittance of 44.6% or more and a degree of polarization of 98% or more and satisfies 0less than equal to[(orthogonal a*)2+(orthogona...