ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,788, issued on April 8, was assigned to DONGWOO FINE-CHEM Co. LTD. (South Korea).
"Composition for removing polymer" was invented by Soon-Hong Pang (Jeollabuk-do, South Korea), Kyeong-Muk Choi (Jeollabuk-do, South Korea) and Han-Byeol Kang (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a composition for removing polymers. The composition contains a fluorinated alkyl compound, a polar aprotic solvent, and an acyclic secondary or tertiary amine compound."
The patent was filed on June 27, 2023, under Application No. 18/215,038.
*For further information, including images, charts and tables, please visit: http://p...