ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,959, issued on Nov. 4, was assigned to DNF Co. LTD. (Daejeon, South Korea).
"Indium compound, method of producing the same, composition for depositing indium-containing thin film, and indium-containing thin film" was invented by Yonghee Kwone (Daejeon, South Korea), Youngjae Im (Daejeon, South Korea), Sangyong Jeon (Daejeon, South Korea), Taeseok Byun (Daejeon, South Korea), Sangchan Lee (Daejeon, South Korea) and Sangick Lee (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are an indium compound, a method of producing the same, a composition for depositing an indium-containing thin film including the same, and a method o...