US Patent Issued to DNF on Nov. 18 for "Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,647, issued on Nov. 18, was assigned to DNF Co. LTD. (Daejeon, South Korea).

"Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same" was invented by Yong Hee Kwone (Daejeon, South Korea), Young Jae Im (Daejeon, South Korea), Sang Yong Jeon (Daejeon, South Korea), Tae Seok Byun (Daejeon, South Korea), Sang Chan Lee (Daejeon, South Korea) and Sang Ick Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a composition for depositing an antimony-containing thin film including a novel antimony compound which may be useful as a precursor of an ant...