US Patent Issued to DNF on May 20 for "Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same" (South Korean Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,304,924, issued on May 20, was assigned to DNF Co. LTD. (Daejeon, South Korea).

"Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same" was invented by Se Jin Jang (Jeju-si, South Korea), Sung Gi Kim (Daejeon, South Korea), Jeong Joo Park (Daejeon, South Korea), Tae Seok Byun (Daejeon, South Korea), Yong Hee Kwone (Cheongju-si, South Korea), Yeong Hun Kim (Daejeon, South Korea), Haengdon Lim (Daejeon, South Korea), Sang Yong Jeon (Sejong-si, South Korea) and Sang Ick Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a novel silylcyclodisilazane compound, a composition fo...