ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,333, issued on Dec. 30, was assigned to DISCO Corp. (Tokyo).
"Cleaning apparatus" was invented by Kentaro Wada (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning apparatus for cleaning a workpiece includes a holding unit for holding an outer circumferential portion of the workpiece thereon, a rotating mechanism for rotating the holding unit, and a cleaning unit for cleaning a reverse side of the workpiece. The cleaning unit includes a cleaning member for contacting the reverse side of the workpiece and a drive mechanism for moving the cleaning member toward and away from the reverse side of the workpiece."
The patent was filed on Jan....