US Patent Issued to DIC on March 11 for "Polyarylene ether ketone resin and production method therefor, and molded article" (Japanese Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,100, issued on March 11, was assigned to DIC Corp. (Tokyo).

"Polyarylene ether ketone resin and production method therefor, and molded article" was invented by Ryuichi Matsuoka (Sakura, Japan), Shoko Nishida (Sakura, Japan), Masaya Masumoto (Sakura, Japan) and Katsuya Maeyama (Yonezawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polyarylene ether ketone resin has a repeating unit (1-1) represented by general formula (1-1) below and a repeating unit (2-1) represented by general formula (2-1) below. In the formulae, R is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, Ar1 and Ar2 are each a divalent organic group (3-1) repre...