US Patent Issued to DIC on Jan. 13 for "Polyarylene sulfide, and purification method and production method therefor" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,697, issued on Jan. 13, was assigned to DIC Corp. (Tokyo).

"Polyarylene sulfide, and purification method and production method therefor" was invented by Taku Ibaraki (Ichihara, Japan), Satoshi Inoue (Ichihara, Japan), Hideki Watanabe (Ichihara, Japan) and Takashi Furusawa (Ichihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a purification method for a polyarylene sulfide (PAS) that can efficiently reduce the amount of a carboxyalkylamino group-containing compound in the PAS by treating the carboxyalkylamino group-containing compound in the PAS under a low pressure without using a strong acid, and a production method for a PAS...