ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,041, issued on Feb. 3, was assigned to DEXERIALS Corp. (Shimotsuke, Japan).
"Antireflection film" was invented by Tomoaki Kobayashi (Tochigi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An antireflection film has high infrared transmittance and excellent flexibility. An antireflection layer includes a base material, a hard coat layer, an adhesion layer, and an antireflection layer in this order, wherein the antireflection layer includes, from the adhesion layer side, a first high refractive index layer having an optical thickness of 41 to 52 nm, a first low refractive index layer having an optical thickness of 41 to 53 nm, a second high refr...