US Patent Issued to Destination 2D on Sept. 9 for "Throughput improvements for low-temperature/beol-compatible highly scalable graphene synthesis methods including processing in retasked tools" (California, Oregon Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,757, issued on Sept. 9, was assigned to Destination 2D Inc. (San Jose, Calif.).

"Throughput improvements for low-temperature/beol-compatible highly scalable graphene synthesis methods including processing in retasked tools" was invented by Ravi Iyengar (Milpitas, Calif.), Kaustav Banerjee (Goleta, Ore.) and Brian Cronquist (Klamath Falls, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A diffusion-couple synthesis method using a graphene synthesis tool (GST) including: providing a substrate-load (SL) which includes first-prepared substrate (fPS) and second-prepared-substrate (sPS), where fPS includes a first-carbon-source (fCS), a first-sacrifi...