US Patent Issued to Destination 2D on July 22 for "Throughput improvements for low-temperature/beol-compatible highly scalable graphene synthesis methods including processing in retasked tools" (California, Oregon Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,061, issued on July 22, was assigned to Destination 2D Inc. (San Jose, Calif.).

"Throughput improvements for low-temperature/beol-compatible highly scalable graphene synthesis methods including processing in retasked tools" was invented by Ravi Iyengar (Milpitas, Calif.), Kaustav Banerjee (Goleta, Calif.) and Brian Cronquist (Klamath Falls, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A diffusion-couple synthesis method using a graphene synthesis tool (GST) including: providing a substrate-load (SL) which includes first-preparedsubstrate (fPS) and second-prepared-substrate (sPS), where fPS includes a first-carbon-source (fCS), a first-sacrifi...