US Patent Issued to Destination 2D on April 29 for "Methods of low-temperature/BEOL-compatible highly scalable graphene synthesis" (British, American Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,286,710, issued on April 29, was assigned to Destination 2D Inc. (Milpitas, Calif.).

"Methods of low-temperature/BEOL-compatible highly scalable graphene synthesis" was invented by Kaustav Banerjee (Goleta, Calif.), Ravi Iyengar (Milpitas, Calif.), Satish Sundar (San Jose, Calif.) and Nalin Rupesinghe (Cambridge, Great Britain).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is described for migration of a deposition material across a diffusion couple deposited on a substrate to a substrate surface including: using a reactor system to facilitate the migration of one or more diffusion materials across a diffusion couple to a substrate by applying a...