ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,388, issued on April 22, was assigned to DESTINATION 2D INC. (Milpitas, Calif.).
"Low-temperature/beol-compatible highly scalable graphene synthesis tool" was invented by Kaustav Banerjee (Goleta, Calif.), Ravi Iyengar (Milipitas, Calif.), Nalin Rupesinghe (Cambridge, Great Britain) and Satish Sundar (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "In one aspect, a highly scalable diffusion-couple apparatus includes a transfer chamber configured to load a wafer into a process chamber. The process chamber is configured to receive the wafer substrate from the transfer chamber. The process chamber comprises a chamber for growth of a diff...